Описание: To maintain performance and production yields of semiconductor devices with ever smaller linewidths, control of elemental impurities in process chemicals used in fabrication (FAB) facilities remains a highly critical application. ASTM D5127-13, 2018 and SEMI F63-0521, 2021 standards provide guidance for industry on the quality of ultrapure water (UPW) needed to produce devices with linewidths < 0.045 microns. Both standards require detection limits (DLs) of less than 0.5 ppt (boron has a higher limit of 15 ppt) and background equivalent concentrations (BECs) less than 1 ppt (50 ppt for B) for a wide range of elements. To meet the stringent standards, the industry is increasingly using triple quadrupole ICP-MS (ICP-QQQ or ICP-MS/MS) for the ultratrace analysis of process chemicals because of its high detection power and flexible operating conditions. Results generated using an ICP-MS/MS method for the Agilent 8900 ICP-QQQ will be presented for the measurement of 26 SEMI-critical elements in low-matrix semiconductor reagents. The instrument was fitted with an optional ion optic ‘m-lens’ designed to minimize background signals from easily ionized elements (EIEs) such as Na, Ba, and Li. The configuration allowed all elements to be measured at ppt levels using robust, hot plasma conditions (CeO/Ce ratio <2%). Details will be provided on the interference removal methods used to achieve sub-ppt level BECs for SEMI elements, including critical metallic (conductive) contaminants such as Al, Cr, Fe, Co, Ni, Cu, Zn, and Mo.
Лектори: Bert Woods, Application Scientist, Agilent Technologies, Inc.
Abe Gutierrez, Product Specialist, Agilent Technologies, Inc.
Продължителност: 1 час
Дата: 26 април 2022, 22:30 ч. българско време
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